Published August 23, 2010 | Version v1
Journal article

The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges

  • 1. Research Institute for Solid State Physics and Optics, Hungarian Academy of Sciences, P.O. Box 49, H-1525 Budapest (Hungary)
  • 2. Institute for Plasma and Atomic Physics, Ruhr-University Bochum, 44801 Bochum (Germany)

Description

Dual-frequency capacitive discharges are used to separately control the mean ion energy, εion, and flux, Γion, at the electrodes. We study the effect of secondary electrons on this separate control in argon discharges driven at 2+27 MHz at different pressures using Particle in Cell simulations. For secondary yield γ≅0, Γion decreases as a function of the low frequency voltage amplitude due to the frequency coupling, while it increases at high γ due to the effective multiplication of secondary electrons inside the sheaths. Therefore, separate control is strongly limited. εion increases with γ, which might allow an in situ determination of γ-coefficients.

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
97
Journal Issue
8
Journal Page Range
p. 081501-081501.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2010 American Institute of Physics