High ion temperature plasmas using an ICRF wall-conditioning technique in the Large Helical Device
- 1. National Institute for Fusion Science, Toki, Gifu (Japan)
- 2. Kyoto University, Department of Nuclear Engineering, Kyoto (Japan)
Description
A new effective wall-conditioning technique was proposed for realizing high ion temperature (Ti) plasmas in the Large Helical Device using the ion cyclotron range of frequency (ICRF) wave under the established magnetic confinement field. A series of ICRF heating discharges using He as the working gas was conducted ahead of the high-Ti plasma discharges. After sufficient repetitive wall-conditioning discharges, we observed a decrease in the line-averaged electron density, the formation of a peaked electron density profile, a reduction in the Hα emission, and an increase in the central Ti. The results suggest that the stored hydrogen inside the vacuum vessel structures, such as the first wall, the diverter, and other components, sputtered out owing to the He plasmas of the ICRF wall-conditioning discharges and the hydrogen recycling was decreased. Consequently, the ion heating power of NBI increased in the plasma core region, leading to higher central Ti. (author)
Availability note (English)
Available from http://dx.doi.org/10.1585/pfr.9.1402050Additional details
Identifiers
Publishing Information
- Journal Title
- Plasma and Fusion Research
- Journal Volume
- 9
- Journal Page Range
- p. 1402050.1-1402050.4
- ISSN
- 1880-6821
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 47015596
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- BALMER LINES; ELECTRON DENSITY; EMISSION; HELIUM; HIGH-FREQUENCY DISCHARGES; ICR HEATING; ION TEMPERATURE; LHD DEVICE; RECYCLING; SHRINKAGE; WALL EFFECTS
- Descriptors DEC
- CLOSED PLASMA DEVICES; ELECTRIC DISCHARGES; ELEMENTS; FLUIDS; GASES; HEATING; HIGH-FREQUENCY HEATING; NONMETALS; PLASMA HEATING; RARE GASES; THERMONUCLEAR DEVICES
Optional Information
- Notes
- 16 refs., 4 figs.