Published February 15, 2011 | Version v1
Journal article

Effect of chemical etching on the Cu/Ni metallization of poly (ether ether ketone)/carbon fiber composites

  • 1. Tianjin Medical College, Tianjin 300222 (China)
  • 2. School of Materials Science and Engineering, Tianjin University, Tianjin 300072 (China)

Description

Poly(ether ether ketone)/carbon fiber composites (PEEK/Cf) were chemical etched by Cr2O3/H2SO4 solution, electroless plated with copper and then electroplated with nickel. The effects of chemical etching time and temperature on the adhesive strength between PEEK/Cf and Cu/Ni layers were studied by thermal shock method. The electrical resistance of some samples was measured. X-ray photoelectron spectroscopy (XPS) was used to analyze the surface composition and functional groups. Scanning electron microscopy (SEM) was performed to observe the surface morphology of the composite, the chemical etched sample, the plated sample and the peeled metal layer. The results indicated that C=O bond increased after chemical etching. With the increasing of etching temperature and time, more and more cracks and partially exposed carbon fibers appeared at the surface of PEEK/Cf composites, and the adhesive strength increased consequently. When the composites were etched at 60 deg. C for 25 min and at 70-80 deg. C for more than 15 min, the Cu/Ni metallization layer could withstand four thermal shock cycles without bubbling, and the electrical resistivity of the metal layer of these samples increased with the increasing of etching temperature and time.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2010.12.035

Additional details

Identifiers

DOI
10.1016/j.apsusc.2010.12.035;
PII
S0169-4332(10)01763-0;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
257
Journal Issue
9
Journal Page Range
p. 4272-4277
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.