Technological equipment of magnetron processes for film materials manufacture

Equipment for coverings formation with transport of multiple ribbon substrates relatively to plasma flows is implemented. The equipment provides simultaneous band movement relatively to the covering deposition zone. The facility includes the carrousel type device for transportation of ribbon substrate with length 30 m and width 50 mm. Problems of finish treatment of a substrate surface before coverings deposition were resolved in the magnetron sputtering device, in which the surface cleaning is carrying by sputtering of upper layer in a low pressure plasma