Modeling of iron oxide deposition by reactive ion beam sputtering

An analytic model of deposition is applied on reactive ion beam sputtering to optimize the properties of iron oxide thin films. This model will be able to predict deposition rate and phase contents. Among its hypotheses, we assume oxygen adsorption at the surface of the target to explain variations of deposition rate for oxygen flow. This hypothesis is validated by chemical analyses on iron targets. An ellipsoidal distribution of probability is introduced to model sputtered matter distribution from iron target and to calculate sputtering yield. Comparison between experimental and calculated deposition rates validates previously assumed hypotheses.