Published 1992 | Version v1
Book

Fabrication of p-type CUINSE2 thin film by MBD using ECR excited nitrogen ion source

  • 1. Matsushita Electric Industrial Co. Ltd., Moriguchi, Osaka (Japan). Central Research Lab.

Description

Polycrystalline CuInSe2 thin films were prepared by coevaporation of the elements under the irradiation of nitrogen ions excited by ECR plasma. Nitrogen atoms were doped uniformly in the obtained CuInSe2 films according to the SIMS analysis. The films showed p-type conduction even in the slightly In-rich region where the coevaporation films without the irradiation of nitrogen atoms showed n-type conduction. These results, included in this paper, show that p-type CuInSe2 thin films even in the slightly In-rich region can be fabricated by the irradiation of ECR excited nitrogen ions during its ternary coevaporation process

Additional details

Publishing Information

Publisher
Materials Research Society.
Imprint Place
Pittsburgh, PA (United States)
ISBN
1-55899-163-8
Imprint Title
Proceedings of materials modifications by energetic atoms and ions
Imprint Pagination
405 p.
Journal Page Range
p. 145-149.

Conference

Title
1992 Material Research Society (MRS) spring meeting.
Dates
27 Apr - 2 May 1992.
Place
San Francisco, CA (United States).

Optional Information

Secondary number(s)
CONF-920402--.