Published June 1997
| Version v1
Journal article
An in situ RBS system for measuring nuclides adsorbed at the liquid-solid interface
Creators
- 1. Nagoya Univ. (Japan). Dept. of Crystal Science
Description
An in situ RBS system has been developed for measuring heavier nuclides adsorbed at the inner surface of a thin lighter window specimen of a liquid container in order to determine the rate constants for their sorption and release at the liquid-solid interface. The tolerance of a thin silicon window of the sample assembly, in which Xe gas of one atmosphere is enclosed, against the bombardment of the probing ion beam has been tested. A desorption behaviour of a lead layer adsorbed at the SiO2 surface layer of the silicon window into deionized water has been measured as a preliminary experiment. (author)
Additional details
Publishing Information
- Journal Title
- Radiation Physics and Chemistry (1993)
- Journal Volume
- 49
- Journal Issue
- 6
- Journal Page Range
- p. 603-608.
- ISSN
- 0969-806X
- CODEN
- RPCHDM
Conference
- Title
- 7. international symposium on advanced nuclear energy research.
- Dates
- 18-20 Mar 1996.
- Place
- Takasaki (Japan).
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United Kingdom
- INIS RN
- 28056425
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; S12: MANAGEMENT OF RADIOACTIVE WASTES, AND NON-RADIOACTIVE WASTES FROM NUCLEAR FACILITIES;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ADSORPTION; CHEMICAL REACTION KINETICS; HELIUM IONS; INTERFACES; ION IMPLANTATION; MEV RANGE 01-10; PERFORMANCE; RADIOACTIVE WASTE DISPOSAL; RADIOISOTOPES; RUTHERFORD SCATTERING; SILICON OXIDES; THIN FILMS
- Descriptors DEC
- CHALCOGENIDES; CHARGED PARTICLES; ELASTIC SCATTERING; ENERGY RANGE; FILMS; IONS; ISOTOPES; KINETICS; MANAGEMENT; MEV RANGE; OXIDES; OXYGEN COMPOUNDS; REACTION KINETICS; SCATTERING; SILICON COMPOUNDS; SORPTION; WASTE DISPOSAL; WASTE MANAGEMENT