Published 2018
| Version v1
Miscellaneous
Study of improvement of a central region and an extraction system of the RCNP AVF cyclotron
- 1. Osaka University, Research Center for Nuclear Physics, Ibaraki, Osaka (Japan)
Description
High quality and high intensity beam of AVF cyclotron at RCNP is used for both nuclear physics and various applied research. It is needed to increase beam intensity for the needs of nuclear medicine. An improvement of injection line, inflector, and central region of cyclotron is needed to increase the intensity of accelerated beam of cyclotron, while extraction system, which limits extraction beam current and causes radio-activation must be improved. Simulation study utilizing SNOP code is performed for high efficiency beam in the cyclotron with space charge effect. The structure of extraction system was determined to increase the efficiency of extraction. (author)
Additional details
Additional titles
- Original title (Japanese)
- RCNP AVFサイクロトロンの高強度化を目指した中心領域及び出射系の改良の検討
Identifiers
Publishing Information
- Imprint Title
- Proceedings of the 15th annual meeting of Particle Accelerator Society of Japan
- Imprint Pagination
- [1380 p.]
- Journal Page Range
- p. 823-825
Conference
- Title
- 15. annual meeting of Particle Accelerator Society of Japan
- Acronym
- PASJ2018
- Dates
- 7-10 Aug 2018
- Place
- Nagaoka, Niigata (Japan)
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 50033783
- Subject category
- S43: PARTICLE ACCELERATORS;
- Resource subtype / Literary indicator
- Conference, Non-conventional Literature
- Descriptors DEI
- BEAM BENDING MAGNETS; BEAM BUNCHERS; BEAM EMITTANCE; BEAM EXTRACTION; BEAM PULSERS; COMPUTERIZED SIMULATION; ELECTRIC FIELDS; ELECTRODES; MAGNETIC FIELDS; MAGNETIC SHIELDING; RCNP CYCLOTRON; SEPTUM MAGNETS; SPACE CHARGE
- Descriptors DEC
- ACCELERATORS; CYCLIC ACCELERATORS; CYCLOTRONS; EQUIPMENT; HEAVY ION ACCELERATORS; ISOCHRONOUS CYCLOTRONS; MAGNETS; SHIELDING; SIMULATION
Optional Information
- Notes
- 7 refs., 6 figs. Imprint:#7B2C#15#56DE##65E5##672C##52A0##901F##5668##5B66##4F1A##5E74##4F1A#