Published December 21, 2012
| Version v1
Journal article
Sensitivity to refractive index of high-aspect-ratio nanofins with optical vortex
Creators
- 1. School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan)
- 2. Interfacial Nanostructure Research Laboratory, RIKEN, Wako, Saitama 351-0198 (Japan)
Description
An easy and large-scale fabrication technique of metal fins was used to produce periodic Au fin arrays that realized light confinement in the near-infrared region. Light confinement was revealed by vortex patterns in the optical power flow of an array of high-aspect-ratio fins (height of 1000 nm for a width of 50 nm). The light confinement resulted in sharp dips in the reflectance spectrum of the high-aspect-ratio fin array. The wavelengths of the reflectance dips were found to shift toward higher values when the refractive index of the surrounding medium was increased. Experimental and simulated dip shift values were in good agreement with a demonstrated sensitivity of 580 nm per refractive index unit. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0957-4484/23/50/505502Additional details
Identifiers
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 23
- Journal Issue
- 50
- Journal Page Range
- [6 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44046368
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ASPECT RATIO; CONFINEMENT; FABRICATION; PERIODICITY; REFRACTIVE INDEX; SENSITIVITY; SIMULATION; SPECTRA; VORTICES
- Descriptors DEC
- DIMENSIONLESS NUMBERS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; VARIATIONS