Published May 1991 | Version v1
Journal article

Study on deuterium diffusion behavior in SiO2 by means of the D(3He,p)4He reaction

  • 1. Tokyo Inst. of Tech., Tokyo-Meguroku (Japan)
  • 2. Central Research Lab., Hitachi Ltd., Kokubunji-shi (Japan)

Description

Deuterium with a concentration of 1016-1019 at./cm3 has been measured quantitatively by using the D(3He,p)4He reaction. The thermal behavior of deuterium in SiO2 has been studied in the temperature range of 200-1000degC. The measurement shows that 1) the deuterium concentration in SiO2 depends on the solubility of SiOD in the temperature region of 200-700degC, and 2) the water (D2O) diffusion is the dominant mechanism for hydrogen diffusion in the temperature region of 700-1000degC. (orig.)

Additional details

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research, Section B
Journal Volume
56/57
Journal Issue
pt.2
Series
Nucl. Instrum. Methods Phys. Res., Sect. B.
Journal Page Range
816-818
ISSN
0168-583X
CODEN
NIMBE

Conference

Title
11. international conference on the application of accelerators in research and industry.
Dates
5-8 Nov 1990.
Place
Denton, TX (United States).