Published 1996 | Version v1
Miscellaneous

The dose distributions of γ ray in the silicon in and near the interfaces of silicon and various materials

  • 1. Academia Sinica, Urumqi (China). Xinjiang Inst. of Physics

Description

The depth dose distributions of γ ray in the silicon in and near the interfaces of silicon and various materials, such as gold, have been studied. The dose distributions have been compared with equilibrium doses in the homogeneous silicon material, and considerable dose gradient distributions were obtained. In the case of silicon adjacent to high atomic numbered material, dose enhancement effects have been observed in and near the interfaces. The dose gradient distributions were explained by photoelectron effect, Auger effect and secondary electron transport mechanism of the low energy scattering photons

Part of:
Proceedings of 8. national conference on nuclear electronic and nuclear detection technology: Pt.2

Additional details

Publishing Information

Imprint Title
Proceedings of 8. national conference on nuclear electronic and nuclear detection technology: Pt.2
Imprint Pagination
338 p.
Journal Page Range
p. 562-566.

Conference

Title
8. national conference on nuclear electronics and nuclear detection technology.
Dates
2-7 Dec 1996.
Place
Zhuhai, GD (China).

Optional Information