Surface topography of amorphous alloys bombarded with helium ions
Creators
- 1. Academia Sinica, Lanzhou (China). Inst. of Modern Physics
Description
The blistering and flaking behavior of many kinds of amorphous alloys under helium ion bombardment at room temperature has been investigated. Helium ions with energies of 40 keV and 60 keV were implanted to the dose range 1.0 x 1018-4.0 x 1018 ions/cm2. The surface topography of samples after irradiation was observed by using a scanning electron microscope. The diameter of blister and the thickness of exfoliated blister lids were measured. The results showed that many kinds of surface topography characteristics appeared for different doses, energies and amorphous alloys, such as flaking, blistering, exfoliation, blister rupture, second-generation blistering and porous structure. The dependence of surface damage modes and the critical dose for onset of blistering and flaking on material sort and ion energy was discussed
Additional details
Publishing Information
- Journal Title
- Nuclear Techniques
- Journal Volume
- 25
- Journal Issue
- 1
- Journal Page Range
- p. 1-8
- ISSN
- 0253-3219
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 33024832
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- AMORPHOUS STATE; BLISTERS; BORON ALLOYS; HELIUM IONS; ION IMPLANTATION; IRON BASE ALLOYS; KEV RANGE 10-100; MORPHOLOGY; NICKEL ALLOYS; RADIATION EFFECTS; SCANNING ELECTRON MICROSCOPY; SURFACES; TOPOGRAPHY
- Descriptors DEC
- ALLOYS; CHARGED PARTICLES; ELECTRON MICROSCOPY; ENERGY RANGE; IONS; IRON ALLOYS; KEV RANGE; MICROSCOPY; TRANSITION ELEMENT ALLOYS