Solid target boronization of the MST reversed-field pinch during pulsed discharge cleaning
Creators
- 1. Univ. of Wisconsin, Madison, WI (United States). Dept. of Physics
Description
A solid rod of hot-pressed boron carbide is currently being used as the source of boron during boronization of MST. In previous work the authors have demonstrated that boronization can be effectively accomplished by insertion of a low apparent density B4C rod into the edge hydrogen plasma of normal high-power RFP discharges. The authors have now extended that technique and can boronize MST by inserting a negatively biased B4C rod into pulsed discharge cleaning (PDC) helium plasmas. The same positive results of reduced impurity contamination and particle reflux are achieved with this new boronization method. The bias for the target is provided by the ohmic heating transformer which is pulsed to produce the PDC discharges. Current flow through the B4C rod is limited by an inductor. The amount of hydrogen in the amorphous boron carbide films is minimal because the only hydrogen in the PDC plasma is that left over from RFP discharges
Availability note (English)
MF available from INIS under the Report Number; Also available from OSTI as DE94015535; NTIS; US Govt. Printing Office Dep.
Files
Additional details
Publishing Information
- Imprint Pagination
- 14 p.
- Report number
- DOE/ER/53198--242
Conference
- Title
- 11. international conference on plasma surface interactions in controlled fusion devices.
- Dates
- 23-27 May 1994.
- Place
- Mito (Japan).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 26004079
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ALUMINIUM; BORON CARBIDES; CONTROL; FIRST WALL; HIGH-FREQUENCY DISCHARGES; MST DEVICE; OXYGEN; PLASMA IMPURITIES; SAWTOOTH OSCILLATIONS; SURFACE CLEANING; VACUUM SYSTEMS
- Descriptors DEC
- BORON COMPOUNDS; CARBIDES; CARBON COMPOUNDS; CLEANING; CLOSED PLASMA DEVICES; ELECTRIC DISCHARGES; ELEMENTS; IMPURITIES; METALS; NONMETALS; OSCILLATIONS; PINCH DEVICES; REVERSED-FIELD PINCH DEVICES; SURFACE FINISHING; THERMONUCLEAR DEVICES; THERMONUCLEAR REACTOR WALLS; TOROIDAL PINCH DEVICES
Optional Information
- Contract/Grant/Project number
- Contract FG02-85ER53198
- Funding organization
- USDOE, Washington, DC (United States).
- Secondary number(s)
- CONF-940580--7.