Published September 30, 2009 | Version v1
Journal article

Spectroscopic studies of (AsSe)100-xAgx thin films

  • 1. Institute of Electrochemistry and Energy Systems, Bulgarian Academy of Sciences, Acad. G. Bonchev Str., Bl. 10, 1113 Sofia (Bulgaria)
  • 2. Thin Films Technology Laboratory, Physics Department, University of Chemical Technology and Metallurgy, 8 Kl. Ohridsky Boulevard, 1756 Sofia (Bulgaria)
  • 3. Laser-Surface-Plasma Interactions Laboratory, Lasers Department, National Institute for Lasers, Plasma and Radiations Physics, PO Box MG-54, Bucharest-Magurele, RO-77125 (Romania)
  • 4. Institute of Nanostructure Technologies and Analytics (INA), University of Kassel, Heinrich-Plett-Str. 40, 34132 Kassel (Germany)

Description

Thin (AsSe)100-xAgx films have been grown onto quartz substrates by vacuum thermal evaporation or pulsed laser deposition from the corresponding bulk materials. The amorphous character of the coatings was confirmed by X-ray diffraction investigations. Their transmission was measured within the wavelength range 400-2500 nm and the obtained spectra were analyzed by the Swanepoel method to derive the optical band gap Eg and the refractive index n. We found that both parameters are strongly influenced by the addition of silver to the glassy matrix: Eg decreases while n increases with Ag content. These variations are discussed in terms of the changes in the atomic and electronic structure of the materials as a result of silver incorporation.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2009.04.055

Additional details

Identifiers

DOI
10.1016/j.apsusc.2009.04.055;
PII
S0169-4332(09)00456-5;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
255
Journal Issue
24
Journal Page Range
p. 9691-9694
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
6. international conference on photo-excited processes and applications
Acronym
6-ICPEPA
Dates
9-12 Sep 2008
Place
Sapporo, Hokkaido (Japan)

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.