Selective etching of YBCO target by ion - plasma sputtering

Single-phase ceramics YBa2Cu3O7 produced by the solid-state sintering and used as a target for ion-plasma deposition of films was studied by X-rays analysis, optical microscopy and microhardness measurement. The following changes occurred in the target during its use: 1- grains having the < 001 > orientation along to the normal to the surface of the target were predominantly etched away by sputtering from the surface of the target; 2 Y2BaCuO5 compound appeared; 3 - nonuniform distribution of oxygen appeared along the cross-section of the target. (Author)