The effect of the rate of deposition on superconductive properties and structure of tin films

The effect of the real rate of deposition on the superconducting properties and structure of tin films deposited in vacuum on room temperature amorphous substrates has been observed and studied for rates in the 5-200 A s-1 range. It is suggested that the oxygen contamination coefficient K, and thus film purity, changes with the rate of deposition. At higher rates, above 100 A s-1, pure smooth films were obtained, suitable for the fabrication of superconducting tunnel junctions. (author)