Published 2002
| Version v1
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Images of ultrathin silicon oxide layers in semiconductor devices by energy filtered electron microscopy
Creators
- 1. FELMI - Forschungsinstitut fuer Elektronenmikroskopie und Feistrukturforschung, TU Graz (Austria)
Description
no abstract available
Files
35097508.pdf
Files
(27.8 kB)
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Additional details
Additional titles
- Original title (German)
- Abbildung ultraduenner Siliziumoxidschichten in Halbleiterbauelementen mittels energiegefilterter Elektronenmikroskopie
Publishing Information
- Publisher
- Oesterreichische Physikalische Gesellschaft
- Imprint Place
- Leoben (Austria)
- Imprint Title
- 52. Annual symposium of the Austrian Physical Society
- Imprint Pagination
- 132 p.
- Journal Page Range
- p. 75
- Report number
- INIS-AT--0046
Conference
- Title
- 52. Annual symposium of the Austrian Physical Society
- Original Conference Title
- 52. Jahrestagung der Oesterreichischen Physikalischen Gesellschaft
- Dates
- 23-26 Sep 2002
- Place
- Leoben (Austria)
INIS
- Country of Publication
- Austria
- Country of Input or Organization
- Austria
- INIS RN
- 35097508
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference, No Abstract
- Descriptors DEI
- EV RANGE 10-100; IMAGES; MOSFET; SILICON OXIDES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- CHALCOGENIDES; ELECTRON MICROSCOPY; ENERGY RANGE; EV RANGE; FIELD EFFECT TRANSISTORS; FILMS; MICROSCOPY; MOS TRANSISTORS; OXIDES; OXYGEN COMPOUNDS; SEMICONDUCTOR DEVICES; SILICON COMPOUNDS; TRANSISTORS
Optional Information
- Notes
- Imprint:52. Jahrestagung der Oesterreichischen Physikalischen Gesellschaft