Published April 10, 2013 | Version v1
Journal article

Schottky barriers based on metal nanoparticles deposited on InP epitaxial layers

  • 1. Institute of Photonics and Electronics, Academy of Sciences CR, v.v.i. Chaberska 57, 18251 Prague 8 (Czech Republic)

Description

Fabrication of high-quality Schottky barriers on InP epitaxial layers prepared by liquid-phase epitaxy from rare-earth treated melts is reported. The Schottky structures are based on metal nanoparticles and a graphite layer deposited from colloidal solutions onto epitaxial layers with varying carrier concentration. The structures have notably high values of the barrier height and of the rectification ratio giving evidence of a small degree of the Fermi-level pinning. Electrical characteristics of these diodes are shown to be extremely sensitive to the exposure of gas mixtures with small hydrogen content. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0268-1242/28/4/045006

Additional details

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
28
Journal Issue
4
Journal Page Range
[5 p.]
ISSN
0268-1242
CODEN
SSTEET

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45013967
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
DEPOSITS; GRAPHITE; INDIUM PHOSPHIDES; LAYERS; LIQUID PHASE EPITAXY; NANOSTRUCTURES; RARE EARTHS
Descriptors DEC
CARBON; CRYSTAL GROWTH METHODS; ELEMENTS; EPITAXY; INDIUM COMPOUNDS; METALS; MINERALS; NONMETALS; PHOSPHIDES; PHOSPHORUS COMPOUNDS; PNICTIDES