Published January 3, 2005 | Version v1
Journal article

Indium oxide as a possible tunnel barrier in spintronic devices

  • 1. Institute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas, P.O. Box 1527, Vassilika Vouton, 711 10 Heraklion, Crete (Greece)
  • 2. Institute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas, P.O. Box 1527, Vassilika Vouton, 711 10 Heraklion, Crete (Greece) and Department of Materials Science and Technology, University of Crete, P.O. Box 2208, 710 03 Heraklion, Crete (Greece)
  • 3. Department of Physics, University of Crete, P.O. Box 2208, 710 03 Heraklion, Crete (Greece)

Description

We report the growth of ultra-thin indium oxide layers using the dc-magnetron sputtering method. We demonstrate that good quality tunnel barriers made of indium oxide can be routinely fabricated and employed in spintronic-related devices. Simple magnetic tunnel junctions (MTJs) were fabricated in a cross geometry using ex situ thermally evaporated cobalt and permalloy. Our best junctions obey the Rowell criteria for tunneling and exhibit a tunnel magnetoresistance of 15% at 100 K

Additional details

Identifiers

DOI
10.1016/j.tsf.2004.06.162;
PII
S0040-6090(04)00975-7;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
471
Journal Issue
1-2
Journal Page Range
p. 293-297
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.