Plasma control and applications using RF resonant electric field

This paper describes the phenomena and applications of a new method for plasma control by radio-frequency (rf) resonant electric field. The rf resonant field makes very huge different phenomena from ordinary rf plasmas because its electric field is enhanced in the plasma and it excites an eigen-mode of a plasma wave. Although the mechanism of the rf resonant electric field is not proved yet in detail especially about behavior of electrons and ions, the rf resonant method is expected to improve the ion extraction efficiency in AVLIS by the enhancement of the electric field in plasma. Since the electric field of rf resonance penetrates deep into the plasma and ions can be controlled easier than the other methods. Therefore the rf resonance method is very attractive for many applications such as plasma CVD, plasma etching and so on, if the behavior of electrons becomes clear understanding and the resonance condition is easily operated. (author)