Published March 1996 | Version v1
Journal article

Basic processes of negative hydrogen ion production and destruction in sources and beams (invited)

  • 1. Laboratoire de Physique des Milieux Ionises, Laboratoire du C.N.R.S., Ecole Polytechnique, 91128 Palaiseau Cedex (France)

Description

This article contains the discussion of new discoveries and ideas relevant to volume H- ion sources and beams. Recent research in laser irradiated H2 by Pinnaduwage and Christophorou has shown that the rates of dissociative attachment are strongly dependent on electronic excitation involving superexcited states and possibly Rydberg states. The observation of anomalous attenuation of a 15 keV H- beam in a hydrogen gas target led us to consider the possibility of secondary H- stripping processes, related to low-energy interactions between primary H- ions and the secondary H+, H0, and electron beams produced by primary stripping. The results of the investigation by electrostatic probes and by photodetachment of the properties of a hydrogen/deuterium multicusp ion source plasma when seeded with cesium vapor are reported. We found that the negative ion/electron density ratio is enhanced by cesium seeding, particularly at low pressure (a factor of 4 at 1 mTorr), while both the electron temperature and the electron density are reduced. copyright 1996 American Institute of Physics

Additional details

Publishing Information

Journal Title
Review of Scientific Instruments
Journal Volume
67
Journal Issue
3
Journal Page Range
p. 1138-1143.
ISSN
0034-6748
CODEN
RSINAK

Conference

Title
6. international conference on ion sources.
Dates
10-16 Sep 1995.
Place
Whistler (Canada).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
28031796
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
BEAM PRODUCTION; CESIUM; DISSOCIATION; ELECTRON TEMPERATURE; HYDROGEN 1 MINUS BEAMS; ION SOURCES; KEV RANGE 10-100; PLASMA DENSITY; PLASMA DIAGNOSTICS
Descriptors DEC
ALKALI METALS; BEAMS; ELEMENTS; ENERGY RANGE; ION BEAMS; KEV RANGE; METALS

Optional Information

Secondary number(s)
CONF-9509125--.