New microwave plasma development with extended operating conditions
Description
This work was done in the 'Laboratoire de Physique Subatomique et de Cosmologie (IN2P3, Grenoble)' during a collaboration with Thales. The aim of the project was the development of a new generation of microwave plasma with extended operating conditions in the pressure range 0.5 mtorr to 10 torr in argon. The presented work consists of: i) designing applicators based on sections of?/4 length serving as impedance transformers between the generator and the plasma with impedance of given assumed value (approximate impedance adaptation); ii) experimentally determine the real plasma impedance (the real part and the imaginary part) for given operating conditions from the measurement of modulus and phase of the reflection coefficient S11; iii) resize the different sections of the applicator by digital simulation taking the real plasma impedance into account; iv) finally, verify experimentally that the impedance adaptation between the generator and the plasma is correct. The obtained results clearly demonstrate that it is possible, at a given frequency (here 2.45 GHz), to design and size a plasma source with an efficiency greater than 80 % for a window in pressure (at least one decade) equivalent to an operating window in terms of plasma parameters. These individual sources with localized absorption of microwaves can be used in numbers to achieve uniform plasmas via their distribution over two-dimensional (planar sources) or tri-dimensional (volume plasma) networks, and thus for industrial surface treatments. (author)
Abstract (French)
Ce travail de these a ete realise au Laboratoire de Physique Subatomique et de Cosmologie (IN2P3) de Grenoble en collaboration avec le groupe Thales avec pour objectif le developpement d'une nouvelle generation de plasmas micro-onde fonctionnant sur une gamme de pression etendue allant de 0,5 mtorr a 10 torr en argon. La travail presente porte donc en: i) la conception des applicateurs bases sur des troncons de longueur?/4 faisant office de transformateurs d'impedance entre le generateur et le plasma d'impedance supposee donnee (adaptation d'impedance approchee); ii) la determination experimentale de l'impedance reelle du plasma (partie reelle et partie imaginaire) par mesure du module et de la phase du coefficient de reflexion dans des conditions operatoires definies; iii) le redimensionnement des differents troncons de l'applicateur par simulation numerique en tenant compte de l'impedance reelle du plasma; iv) la validation experimentale de l'adaptation d'impedance entre generateur et plasma. Les resultats obtenus demontrent clairement qu'il est possible, a frequence donnee (2.45 GHz dans le cas present), de concevoir et de dimensionner une source plasma avec une efficacite energetique superieure a 80% pour des fenetres en pression (d'au moins une decade) equivalentes a des fenetres operatoires en termes de parametres plasma. Ces sources individuelles a absorption localisee de micro-ondes peuvent etre utilisees en nombre pour la realisation des plasmas uniformes de grandes dimensions par leur distribution selon des reseaux a deux dimensions (sources planes) ou a trois dimensions (volumes de plasma), et donc pour des applications industrielles aux traitements de surface. (auteur)Files
54027962.pdf
Files
(11.8 MB)
| Name | Size | Download all |
|---|---|---|
|
md5:1e6b14497a086f2e4b9959485314e40c
|
11.8 MB | Preview Download |
Additional details
Additional titles
- Original title (French)
- Developpement d'une nouvelle generation de plasmas micro-onde a conditions operatoires etendues
Publishing Information
- Imprint Pagination
- 201 p.
- Report number
- FRNC-TH--13914
INIS
- Country of Publication
- France
- Country of Input or Organization
- France
- INIS RN
- 54027962
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Thesis
- Descriptors DEI
- COMPUTERIZED SIMULATION; ELECTRIC DISCHARGES; GHZ RANGE 01-100; MAGNETRONS; MICROWAVE RADIATION; PLASMA DENSITY; PLASMA PRESSURE; PLASMA PRODUCTION; WAVE PROPAGATION; WAVEGUIDES
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; FREQUENCY RANGE; GHZ RANGE; MICROWAVE EQUIPMENT; MICROWAVE TUBES; RADIATIONS; SIMULATION
Optional Information
- Notes
- 71 refs.; Available from the INIS Liaison Officer for France, see the INIS website for current contact and E-mail addresses