Electrochemical behavior of chromium during ion lithography

Corrosion characteristics of thin chromium films depending on technological factors of preparation of specimen surfaces and ion-implantation treatment are studied. Conditions of reproducible decrease of chromium chemical activity under bombardment by ions of chemically active impurities and noble gases, permitting to consider implanted metals as negative inorganic protective layers for shaping topological integral circuit diagrams, are established. Possible mechanisms of ion-stimulated chemical passivation effect are considered. On the basis of analysis of corrosion, electrophysical and structurally morphological characteristics a conclusion is made about prospects of using ions of noble gases as exposure emission