Prompt Gamma Neutron Activation Analysis of Niobium for Characterization of Light Interstitials

High purity niobium metal is used in the construction of superconducting radio frequency (SRF) cavities in superconducting particle accelerators. The Spallation Neutron Source at Oak Ridge National Laboratory is an example of an SRF linear accelerator (LINAC) that requires this high purity niobium material. For the SRF cavities to function well, it is necessary that the cavity wall have a high thermal conductivity so that the radio frequency (RF) power can be dissipated into the liquid helium coolant. For a high thermal conductivity of the niobium metal to be achieved, it is required to have extremely low levels of impurities. The current industry standard for determining the quality of the high purity niobium material is the residual resistivity ratio (RRR) technique. In this technique, the temperature dependency of a niobium metal sample is determined at temperatures near that of liquid helium in order to establish where the superconducting jump occurs. With this method, it is possible to find the general level of impurity of the metal sample, but not the specific elements that are contributing to the impurity. The impurities that are of particular interest to manufacturers of niobium for SRF use are tantalum and light interstitials, such as hydrogen, carbon, nitrogen, and oxygen. In this research, we focus on determining the analytical sensitivity of the detector system and characterizing the light interstitial content in high purity niobium metal through the use of Prompt Gamma Neutron Activation Analysis (PGNAA). PGNAA is an analytical technique that can be utilized to determine the concentration of elemental components in a wide variety of materials with high precision and reproducibility. In this process, neutrons bombard a sample material, causing the emission of gamma rays from the sample. Each element emits a unique spectrum of gamma radiation, which allows for identification of the elements present in the sample. (authors)