A flat gain GaN MMIC power amplifier for X band application
Creators
- 1. Nanjing Electronic Devices Institute, Nanjing 210016 (China)
- 2. Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 (China)
Description
A flat gain two-stage MMIC power amplifier with a 2.8 GHz bandwidth is successfully developed for X band frequency application based on a fully integrated micro-strip AlGaN/GaN HEMT technology on a semi-insulating SiC substrate. Designed with a binary-cluster matching structure integrated with RC networks and LRC networks, the developed power MMIC gets a very flat small signal gain of 15 dB with a gain ripple of 0.35 dB over 9.1–11.9 GHz at the drain bias of 20 V. These RC networks are very easy to improve the stability of used GaN HEMTs with tolerance to the MMIC technology. Inside the frequency range of 9–11.2 GHz where the measurement system calibrated, the amplifier delivers a pulsed output power of 39 dBm and an associated power added efficiency of about 20% at 28 V without saturation, as the available RF power is limited. (semiconductor integrated circuits)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/35/12/125004Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 35
- Journal Issue
- 12
- Journal Page Range
- [5 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47014459
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- DESIGN; EFFICIENCY; GALLIUM NITRIDES; GHZ RANGE; INTEGRATED CIRCUITS; POWER AMPLIFIERS; PULSES; SATURATION; SEMICONDUCTOR MATERIALS; SIGNALS; SILICON CARBIDES; SUBSTRATES
- Descriptors DEC
- AMPLIFIERS; CARBIDES; CARBON COMPOUNDS; ELECTRONIC CIRCUITS; ELECTRONIC EQUIPMENT; EQUIPMENT; FREQUENCY RANGE; GALLIUM COMPOUNDS; MATERIALS; MICROELECTRONIC CIRCUITS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SILICON COMPOUNDS