Ion etching in metallography

Ion etching has proved advantages over conventional metallographic microstructure investigations if special problems have to be solved. The different modes of operation of ion etching processes (inert/reactive sputtering) offer a lot of possibilities because it facilitates the variation of the diverse parameters. Ion etching can be applied in metallography, for example in the surface purification by the removal of layers, in the structure development of non-conductors and heterogeneous material combinations, as well as in the investigation of volume damages, like cracks, pores and cavities. It might be desirable for metallography laboratories to have a simple ion etching device at their disposal. (orig.)