Published September 1, 2012
| Version v1
Journal article
A promising solution using CVD diamond for efficient cooling of power devices
- 1. LAAS-CNRS (France)
- 2. University of Toulouse, INP (France)
- 3. University of Toulouse, INSA (France)
Description
Diamond has several exceptional physical and chemical characteristics. This is the best material for both electrical insulators (10 MV cm−1) and thermal conductors (2000 W m−1 K−1, five times more than copper at room temperature). In this study, we analyzed and quantified the advantages of the insertion of CVD diamond layer in the innovative thermal management assemblies. We also developed a specific model to simulate the working environment of the component. In the simulation, we compared the use of a traditional substrate (AlN) with that of the diamond CVD one in order to confirm that using the diamond substrate reduced thermal resistance.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.mseb.2012.03.005Additional details
Identifiers
- DOI
- 10.1016/j.mseb.2012.03.005;
- PII
- S0921-5107(12)00129-8;
Publishing Information
- Journal Title
- Materials Science and Engineering. B, Solid-State Materials for Advanced Technology
- Journal Volume
- 177
- Journal Issue
- 15
- Journal Page Range
- p. 1358-1361
- ISSN
- 0921-5107
- CODEN
- MSBTEK
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44110044
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM NITRIDES; CHEMICAL VAPOR DEPOSITION; COOLING; COPPER; DIAMONDS; ELECTRICAL INSULATORS; ELECTROMECHANICS; HEAT TRANSFER; LAYERS; MICROSTRUCTURE; SIMULATION; TEMPERATURE RANGE 0273-0400 K
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CARBON; CHEMICAL COATING; DEPOSITION; ELECTRICAL EQUIPMENT; ELEMENTS; ENERGY TRANSFER; EQUIPMENT; MECHANICS; METALS; MINERALS; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES; SURFACE COATING; TEMPERATURE RANGE; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.