Published May 28, 2012 | Version v1
Miscellaneous Open

Electrodeless wet etching of n-GaN assisted with ultraviolet light

  • 1. Institute of Electronics and Photonics, Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, 81219 Bratislava (Slovakia)

Description

In this paper we studied photo-assisted electrodeless etching (ELPEC) of n-GaN in a K2S2O8/KOH solution irradiated continuously with UV light. We investigated the impact of mask material on n-GaN patterning. As mask material thin layers of Ti, Pt and Au were used. The ratio of mask covered surface area to uncovered one was 7:1, 1:2 and 1:5. The K2S2O8 oxidizing agent concentration was kept in the range from 0.006 to 0.1 M, the KOH electrolyte concentration was kept in the range from 0.004 to 0.04 M. (authors)

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Part of:
Proceedings of the 18th International Conference on Applied Physics of Condensed Matter

Additional details

Publishing Information

Publisher
Slovak University of Technology
Imprint Place
Bratislava (Slovakia)
ISBN
978-80-227-3720-3
Imprint Title
Proceedings of the 18th International Conference on Applied Physics of Condensed Matter
Imprint Pagination
369 p.
Journal Page Range
p. 235-238
Report number
INIS-SK--2017-027

Conference

Title
18. International Conference on Applied Physics of Condensed Matter
Acronym
APCOM 2012
Dates
20-22 Jun 2012
Place
Strbske Pleso (Slovakia)

Optional Information

Contract/Grant/Project number
Grants VEGA-01/0689/09; VEGA-01/0459/12
Notes
4 figs., 5 refs. Imprint:Published also on CDROM 32 MBytes in PDF format