Published June 2017
| Version v1
Journal article
Composition-ratio control of CuInS2 films using PLD
- 1. Department of Electrical and Electronic Engineering, Chiba Institute of Technology, 2-17-1 Tsudanuma, Narashino, Chiba 275-0016 (Japan)
- 2. Department of Physics and Electronics, Osaka Prefecture University, 1-1 Gakuencho, Naka-ku, Sakai, Osaka 599-8531 (Japan)
Description
A sulfur-annealing treatment was investigated to control the sulfur content of epitaxial CuInS2 films grown on GaAs substrate by PLD. The sulfur-annealing treatment improved the surface roughness and film crystallinity. Photoluminescence measurements obtained using the confocal microspectroscopy demonstrated that the annealed films show band-edge emissions over a very large area. Electron-probe microanalysis measurements indicated that the sulfur content of the annealed films was about 50 at.%, and the content of the emission area was more than 50 at.%. Therefore, the sulfur content of epitaxial CuInS2 films was successfully controlled by the sulfur-annealing treatment. (copyright 2017 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)
Additional details
Identifiers
Publishing Information
- Journal Title
- Physica Status Solidi. C, Current Topics in Solid State Physics (Online)
- Journal Volume
- 14
- Journal Issue
- 6
- Journal Page Range
- p. 1-4
- ISSN
- 1610-1642
- CODEN
- PSSCGL
Conference
- Title
- 20. international conference on ternary and multinary compounds
- Acronym
- 20. ICTMC
- Dates
- 5-9 Sep 2016
- Place
- Halle-Saale (Germany)
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 48070102
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANNEALING; CHEMICAL COMPOSITION; COPPER SULFIDES; CRYSTAL STRUCTURE; ELECTRON DIFFRACTION; ELECTRON MICROPROBE ANALYSIS; INDIUM SULFIDES; LASER RADIATION; PHOTOLUMINESCENCE; PULSE TECHNIQUES; SCANNING ELECTRON MICROSCOPY; SOLAR CELLS; TEMPERATURE RANGE 0400-1000 K; THIN FILMS; VAPOR DEPOSITED COATINGS; VAPOR PHASE EPITAXY; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; CHEMICAL ANALYSIS; COATINGS; COHERENT SCATTERING; COPPER COMPOUNDS; CRYSTAL GROWTH METHODS; DIFFRACTION; DIRECT ENERGY CONVERTERS; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; EMISSION; EPITAXY; EQUIPMENT; FILMS; HEAT TREATMENTS; INDIUM COMPOUNDS; LUMINESCENCE; MICROANALYSIS; MICROSCOPY; NONDESTRUCTIVE ANALYSIS; PHOTOELECTRIC CELLS; PHOTON EMISSION; PHOTOVOLTAIC CELLS; RADIATIONS; SCATTERING; SOLAR EQUIPMENT; SULFIDES; SULFUR COMPOUNDS; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- With 7 figs.