Published December 1996 | Version v1
Journal article

Characterization of the noise in secondary ion mass spectrometry depth profiles

  • 1. Department of Physics, University of Warwick, Coventry CV4 7AL (United Kingdom)

Description

The noise in the depth profiles of secondary ion mass spectrometry (SIMS) is studied using different samples under various experimental conditions. Despite the noise contributions from various parts of the dynamic SIMS process, its overall character agrees very well with the Poissonian rather than the Gaussian distribution in all circumstances. The Poissonian relation between the measured mean-square error and mean can be used to describe our data in the range of four orders. The departure from this relation at high counts is analyzed and found to be due to the saturation of the channeltron used. Once saturated, the detector was found to exhibit hysteresis between rising and falling input flux and output counts. copyright 1996 American Institute of Physics

Additional details

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
80
Journal Issue
12
Journal Page Range
p. 7104-7107.
ISSN
0021-8979
CODEN
JAPIAU

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
28015075
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
CRYSTAL DOPING; IMPURITIES; ION BEAMS; ION MICROPROBE ANALYSIS; MASS SPECTROSCOPY; NOISE; SPUTTERING
Descriptors DEC
BEAMS; CHEMICAL ANALYSIS; MICROANALYSIS; NONDESTRUCTIVE ANALYSIS; SPECTROSCOPY