Characterization of the noise in secondary ion mass spectrometry depth profiles
Creators
- 1. Department of Physics, University of Warwick, Coventry CV4 7AL (United Kingdom)
Description
The noise in the depth profiles of secondary ion mass spectrometry (SIMS) is studied using different samples under various experimental conditions. Despite the noise contributions from various parts of the dynamic SIMS process, its overall character agrees very well with the Poissonian rather than the Gaussian distribution in all circumstances. The Poissonian relation between the measured mean-square error and mean can be used to describe our data in the range of four orders. The departure from this relation at high counts is analyzed and found to be due to the saturation of the channeltron used. Once saturated, the detector was found to exhibit hysteresis between rising and falling input flux and output counts. copyright 1996 American Institute of Physics
Additional details
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 80
- Journal Issue
- 12
- Journal Page Range
- p. 7104-7107.
- ISSN
- 0021-8979
- CODEN
- JAPIAU
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 28015075
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- CRYSTAL DOPING; IMPURITIES; ION BEAMS; ION MICROPROBE ANALYSIS; MASS SPECTROSCOPY; NOISE; SPUTTERING
- Descriptors DEC
- BEAMS; CHEMICAL ANALYSIS; MICROANALYSIS; NONDESTRUCTIVE ANALYSIS; SPECTROSCOPY