Published July 2011 | Version v1
Journal article

THz generation from a nanocrystalline silicon-based photoconductive device

  • 1. Carnegie Laboratory of Physics, School of Engineering, Physics and Mathematics, University of Dundee, DD1 4HN (United Kingdom)
  • 2. NCR FSG Ltd, Discovery Centre, 3 Fulton Rd, Dundee DD2 4 SW (United Kingdom)

Description

Terahertz generation has been achieved from a photoconductive switch based on hydrogenated nanocrystalline silicon (nc-Si:H), gated by a femtosecond laser. The nc-Si:H samples were produced by a hot wire chemical vapour deposition process, a process with low production costs owing to its higher growth rate and manufacturing simplicity. Although promising ultrafast carrier dynamics of nc-Si have been previously demonstrated, this is the first report on THz generation from a nc-Si:H material

Availability note (English)

Available from http://dx.doi.org/10.1088/0268-1242/26/7/075015

Additional details

Identifiers

DOI
10.1088/0268-1242/26/7/075015;
PII
S0268-1242(11)76648-2;

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
26
Journal Issue
7
Journal Page Range
[5 p.]
ISSN
0268-1242
CODEN
SSTEET

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45014445
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
CHEMICAL VAPOR DEPOSITION; CRYSTALS; NANOSTRUCTURES; SILICON
Descriptors DEC
CHEMICAL COATING; DEPOSITION; ELEMENTS; SEMIMETALS; SURFACE COATING