Published July 2011
| Version v1
Journal article
THz generation from a nanocrystalline silicon-based photoconductive device
- 1. Carnegie Laboratory of Physics, School of Engineering, Physics and Mathematics, University of Dundee, DD1 4HN (United Kingdom)
- 2. NCR FSG Ltd, Discovery Centre, 3 Fulton Rd, Dundee DD2 4 SW (United Kingdom)
Description
Terahertz generation has been achieved from a photoconductive switch based on hydrogenated nanocrystalline silicon (nc-Si:H), gated by a femtosecond laser. The nc-Si:H samples were produced by a hot wire chemical vapour deposition process, a process with low production costs owing to its higher growth rate and manufacturing simplicity. Although promising ultrafast carrier dynamics of nc-Si have been previously demonstrated, this is the first report on THz generation from a nc-Si:H material
Availability note (English)
Available from http://dx.doi.org/10.1088/0268-1242/26/7/075015Additional details
Identifiers
- DOI
- 10.1088/0268-1242/26/7/075015;
- PII
- S0268-1242(11)76648-2;
Publishing Information
- Journal Title
- Semiconductor Science and Technology
- Journal Volume
- 26
- Journal Issue
- 7
- Journal Page Range
- [5 p.]
- ISSN
- 0268-1242
- CODEN
- SSTEET
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45014445
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; CRYSTALS; NANOSTRUCTURES; SILICON
- Descriptors DEC
- CHEMICAL COATING; DEPOSITION; ELEMENTS; SEMIMETALS; SURFACE COATING