Published November 15, 2010 | Version v1
Journal article

Spectroscopic ellipsometric analysis of ZnSe1-xOx layers with different O compositions

  • 1. Department of Electrical Engineering, National Central University, Jhongli, 32001 Taiwan (China)
  • 2. Department of Optics and Photonics, National Central University, Jhongli, 32001 Taiwan (China)
  • 3. Institute of Nuclear Energy Research, Atomic Energy Council, Executive Yuan, Longtan, 32546 Taiwan (China)
  • 4. Research Center for Applied Sciences, Academia Sinica, Taipei, 11529 Taiwan (China)

Description

In this study, ZnSe1-xOx layers with oxygen contents of up to 7.0% are successfully grown at 300 deg. C on semi-insulating GaAs substrates by molecular beam epitaxy. The deposited ZnSe1-xOx films are characterized by Raman spectroscopy and the optical properties studied by spectroscopic ellipsometry. We examine the complex dielectric function obtained by spectroscopic ellipsometry in the photon range from 1.5 to 5 eV. The shifting and broadening of the critical points in the ZnSe1-xOx epilayers as a function of the O composition are investigated for the first time. The characteristics of the peaks change as the O composition increases. The second derivative of the dielectric function is presented and analyzed. The dielectric function spectra reveal distinct structures which can be attributed to the band gap and optical transitions at higher energy.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
108
Journal Issue
10
Journal Page Range
p. 103113-103113.5
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2010 American Institute of Physics