Published October 2004 | Version v1
Report

A round robin characterization of the thickness and composition of thin to ultra-thin aluminum oxynitride films

  • 1. Instituto Tecnologico e Nuclear (Portugal)

Description

A round-robin exercise involving 16 laboratories was undertaken to test the capabilities of various analytical techniques to determine the composition and thickness of thin to ultra-thin AlOxNy films. Both accelerator-based, ion beam analytical techniques and non-nuclear techniques of analysis were used by participating laboratories. The accelerator-based techniques were found to able to provide the required information, as opposed to non-nuclear techniques. There is good agreement between the results reported by accelerator laboratories. (author)

Part of:
Ion beam techniques for the analysis of light elements in thin films, including depth profiling. Final report of a co-ordinated research project 2000-2003

Additional details

Publishing Information

ISBN
92-0-110404-9
Imprint Title
Ion beam techniques for the analysis of light elements in thin films, including depth profiling. Final report of a co-ordinated research project 2000-2003
Imprint Pagination
133 p.
Journal Page Range
p. 23-28
ISSN
1011-4289
Report number
IAEA-TECDOC--1409

INIS

Country of Publication
International Atomic Energy Agency (IAEA)
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
36083477
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ACCELERATORS; ALUMINIUM NITRIDES; INTERLABORATORY COMPARISONS; ION BEAMS; LAYERS; MAGNETORESISTANCE; OXYGEN COMPOUNDS; THICKNESS; THIN FILMS; TUNNEL EFFECT
Descriptors DEC
ALUMINIUM COMPOUNDS; BEAMS; DIMENSIONS; ELECTRIC CONDUCTIVITY; ELECTRICAL PROPERTIES; FILMS; NITRIDES; NITROGEN COMPOUNDS; PHYSICAL PROPERTIES; PNICTIDES

Optional Information

Notes
3 refs, 6 tabs