Published May 1991 | Version v1
Journal article

YBaCuO epitaxial film formation by magnetron sputtering with facing targets, 1

  • 1. Nippon Telegraph and Telephone Corp., Tokai, Ibaraki (Japan). Applied Electronics Labs.

Description

YBa2Cu3O7-δ(YBCO) thin films were prepared on non-rotating MgO(100) substrates at 630degC using dc magnetron sputtering with facing targets (dc-MSFT) and the influence of target and substrate positions on film characteristics, such as superconducting properties, composition (CCu/Y, CBa/Y), crystallinity and uniformity was investigated. Spatial positions at which as-grown epitaxial films with Tce=90 K were deposited were consequently found. Away from the center position, the composition of thin film deviated from a stoichiometric composition, that is, both CCu/Y and CBa/Y had a tendency to decrease. As-grown films with of Tce over 88 K were obtained in a 5 x 5 cm2 area of the substrate. The deposition rate was about 20 A/min at the center position and decreased by 22% at a position 2.5 cm away from the center. (author)

Additional details

Additional titles

Subtitle (English)
Effects of target and substrate positions

Publishing Information

Journal Title
Japanese Journal of Applied Physics, Part 1
Journal Volume
30
Journal Issue
5
Series
Jpn. J. Appl. Phys., Part 1.
Journal Page Range
939-944
ISSN
0021-4922
CODEN
JAPND