Published June 1, 2017 | Version v1
Journal article

High-performance near-infrared photodetector based on nano-layered MoSe2

  • 1. Department of Electrical Engineering, Chosun University, 375, Seosuk–dong, Dong–gu, Gwangju 501–759 (Korea, Republic of)
  • 2. Organization for Research Promotion, Research Promotion Center, The University of Electro–Communications (UEC) 1–5–1 Chofugaoka Chofu, Tokyo Japan, 182–8585 (Japan)
  • 3. Department of Engineering Science, The University of Electro–Communications (UEC) 1–5–1 Chofugaoka Chofu, Tokyo Japan, 182–8585 (Japan)

Description

In recent years, the integration of two-dimensional (2D) nanomaterials, especially transition metal chalcogendies (TMCs) and dichalcogendies (TMDCs), into electronic devices have been extensively studied owing to their exceptional physical properties such as high transparency, strong photoluminescence, and tunable bandgap depending on the number of layers. Herein, we report the optoelectronic properties of few-layered MoSe2-based back-gated phototransistors used for photodetection. The photoresponsivity could be easily controlled to reach a maximum value of 238 AW−1 under near-infrared light excitation, achieving a high specific detectivity ( D = 7.6 × 10 11 c m H z 1 / 2 W 1 ) . Few-layered MoSe2 exhibited excellent optoelectronic properties compared with those reported previously for multilayered 2D material-based photodetectors, indicating that our device is one of the best high-performance nanoscale near-infrared photodetectors based on multilayered two-dimensional materials. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6641/aa6819

Additional details

Identifiers

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
32
Journal Issue
6
Journal Page Range
[8 p.]
ISSN
0268-1242
CODEN
SSTEET