Published April 1989
| Version v1
Journal article
Ion bombardment effect on orientation and face formation of tungsten layer crystals
Description
Effect of ion bombardment of the surface on formation of tungsten layer crystals obtained by dissociation of tungsten hexachloride in glow discharge is studied. The layers were grown at tungsten, molybdenum and molybdenum carbide substrates, the deposition temperature being 1300...2300 K. It is stated that ion bombardment of the surface in WCl6 vapour has an effect on all growth stages and permits to get tungsten layers with the reguired orientation and faceting of crystalline grains
Additional details
Additional titles
- Original title (Russian)
- Влияние ионной бомбардировки на ориентировку и огранение кристаллитов вольфрамовых слоев
Publishing Information
- Journal Title
- Radiotekhnika i Ehlektronika
- Journal Volume
- 34
- Journal Issue
- 4
- Series
- Radiotekh. Ehlektron.
- Journal Page Range
- 848-852
- ISSN
- 0033-8494
- CODEN
- RAELA
INIS
- Country of Publication
- Russian Federation
- Country of Input or Organization
- USSR
- INIS RN
- 21002031
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; GLOW DISCHARGES; GRAIN ORIENTATION; MICROSTRUCTURE; PHYSICAL RADIATION EFFECTS; TUNGSTEN; VERY HIGH TEMPERATURE
- Descriptors DEC
- CHEMICAL COATING; CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC DISCHARGES; ELEMENTS; METALS; ORIENTATION; RADIATION EFFECTS; SURFACE COATING; TRANSITION ELEMENTS