Published 1990
| Version v1
Book
Effect of the deposition parameters on the electro optical properties and morphology of microcrystalline hydrogenated silicon alloys
- 1. Lab. de Microelectronica, Univ. de Sao Paulo, Caixa Postal 8174, 05508 San Paulo (Brazil)
- 2. CFM/IST, Univ. Nova de Lisboa, 1000 Lisboa (Portugal)
Description
Microcrystalline phosphorus doped hydrogenated silicon alloy films were deposited in a remote plasma CVD system. The films properties were studied as a function of r.f. power density and hydrogen concentration on the reaction gases mixture. Properties of the deposited films are extremely sensitive to the r.f. power density in the studied range of 250 mW/cm2 to 625 mW/cm2. This paper reports that very low values of electrical resistivities were obtained
Additional details
Publishing Information
- Publisher
- IEEE Service Center.
- Imprint Place
- Piscataway, NJ (USA)
- Imprint Title
- Twenty first IEEE photovoltaic specialists conference 1990 (Conference Record)
- Imprint Pagination
- 1673 p.
- Journal Page Range
- p. 1588-1590.
Conference
- Title
- 21. Institute for Electrical and Electronics Engineers (IEEE) photovoltaic specialists conference.
- Dates
- 21-25 May 1990.
- Place
- Kissimmee, FL (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 22050023
- Subject category
- S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ACTIVATION ENERGY; CHEMICAL VAPOR DEPOSITION; CRYSTAL DOPING; ELECTRICAL PROPERTIES; ELECTRO-OPTICAL EFFECTS; GRAIN SIZE; HYDROGENATION; LATTICE PARAMETERS; MEV RANGE 10-100; MIXTURES; PHASE TRANSFORMATIONS; PHOSPHORUS ADDITIONS; RF SYSTEMS; SILICON ALLOYS; SOLID-STATE PLASMA; THIN FILMS
- Descriptors DEC
- ALLOYS; CHEMICAL COATING; CHEMICAL REACTIONS; CRYSTAL STRUCTURE; DEPOSITION; DISPERSIONS; ENERGY; ENERGY RANGE; FILMS; MEV RANGE; MICROSTRUCTURE; PHYSICAL PROPERTIES; PLASMA; SIZE; SURFACE COATING
Optional Information
- Secondary number(s)
- CONF-900542--.