Published 2005
| Version v1
Journal article
Capacitance spectroscopy study of high energy electron irradiated and annealed 4H-SiC
- 1. Univ. of Oslo, Physical Electronics, Oslo (Norway)
- 2. Royal Inst. of Tech., Lab. of Materials and Semiconductor Physics (Sweden)
Description
Deep level transient spectroscopy (DLTS) was employed to investigate the annealing behaviour and thermal stability of radiation induced defects in nitrogen doped 4H-SiC epitaxial layers, grown by chemical vapor deposition (CVD). The epilayers have been irradiated with 15 MeV electrons and an isochronal annealing series has been carried out. The measurements have been performed after each annealing step and six electron traps located in the energy band gap range of 0.42-1.6 eV below the conduction band edge (Ec) have been detected. (orig.)
Additional details
Publishing Information
- Journal Title
- Materials Science Forum
- Journal Volume
- 483-485
- Journal Page Range
- p. 365-368
- ISSN
- 0255-5476
- CODEN
- MSFOEP
INIS
- Country of Publication
- Switzerland
- Country of Input or Organization
- Switzerland
- INIS RN
- 36071914
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; DEEP LEVEL TRANSIENT SPECTROSCOPY; DIELECTRIC PROPERTIES; ELECTRON COLLISIONS; ENERGY LEVELS; LAYERS; MEV RANGE 10-100; PHYSICAL RADIATION EFFECTS; SILICON CARBIDES; TEMPERATURE RANGE 0273-0400 K; TEMPERATURE RANGE 0400-1000 K; TEMPERATURE RANGE 1000-4000 K; TRAPS
- Descriptors DEC
- CARBIDES; CARBON COMPOUNDS; COLLISIONS; ELECTRICAL PROPERTIES; ENERGY RANGE; HEAT TREATMENTS; MEV RANGE; PHYSICAL PROPERTIES; RADIATION EFFECTS; SILICON COMPOUNDS; SPECTROSCOPY; TEMPERATURE RANGE