Submicron-scale depth profiling of residual stress in amorphous materials by incremental focused ion beam slotting
- 1. School of Materials, University of Manchester, Grosvenor Street, Manchester M1 7HS (United Kingdom)
- 2. Department of Materials Science and Engineering, University of Tennessee, Knoxville, TN 37996 (United States)
- 3. Materials Science and Engineering, Tohoku University, Sendai (Japan)
Description
This paper reports a new technique, namely the incremental micro-slotting cutting method, for the investigation of residual stress profiles as a function of depth on a micron scale. The residual-stresses in a peened bulk-metallic glass (BMG) (Zr50Cu40Al10, in atomic per cent) are estimated using finite-element analysis of the surface relaxations, as measured by digital image correlation analysis from field-emission gun scanning electron microscopy images, which occur when a micro-slot is stepwise micro-machined by focused ion beam. The calculation algorithm, which solves this inverse problem of residual-stress estimation, is based on the unit pulses method and is stabilized by a Tikhonov regularization scheme. It is demonstrated on a peened BMG that the new technique allows residual-stress profiles in amorphous materials to be inferred with high spatial definition (∼400 nm). Observations point to the scalability of this method to study residual-stress profiles in volumes as small as 1 × 1 × 0.2 μm3 or less, and is particularly well suited to glasses, but can also be applied to crystalline materials.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.actamat.2011.12.035Additional details
Identifiers
- DOI
- 10.1016/j.actamat.2011.12.035;
- PII
- S1359-6454(11)00897-4;
Publishing Information
- Journal Title
- Acta Materialia
- Journal Volume
- 60
- Journal Issue
- 5
- Journal Page Range
- p. 2337-2349
- ISSN
- 1359-6454
- CODEN
- ACMAFD
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43117535
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALGORITHMS; FIELD EMISSION; FINITE ELEMENT METHOD; GLASS; IMAGES; ION BEAMS; MATERIALS; METALLIC GLASSES; RELAXATION; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; SURFACES
- Descriptors DEC
- BEAMS; CALCULATION METHODS; ELECTRON MICROSCOPY; EMISSION; MATHEMATICAL LOGIC; MATHEMATICAL SOLUTIONS; MICROSCOPY; NUMERICAL SOLUTION; STRESSES
Optional Information
- Copyright
- Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.