Published May 25, 2018 | Version v1
Journal article

Efficient band structure modulations in two-dimensional MnPSe3/CrSiTe3 van der Waals heterostructures

  • 1. Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparation Technology, School of Science, Tianjin University, Tianjin 300354 (China)
  • 2. School of Electrical and Electronic Engineering, Tianjin University of Technology, Tianjin 300384 (China)
  • 3. Key Laboratory for Green Chemical Technology of the Ministry of Education, School of Chemical Engineering and Technology, Tianjin University, Tianjin 300354 (China)

Description

As a research upsurge, van der Waals (vdW) heterostructures give rise to numerous combined merits and novel applications in nanoelectronics fields. Here, we systematically investigate the electronic structure of MnPSe3/CrSiTe3 vdW heterostructures with various stacking patterns. Then, particular attention of this work is paid on the band structure modulations in MnPSe3/CrSiTe3 vdW heterostructures via biaxial strain or electric field. Under a tensile strain, the relative band edge positions of heterostructures transform from type-I (nested) to type-II (staggered). The relocation of conduction band minimum also brings about a transition from indirect to direct band gap. Under a compressive strain, the electronic properties change from semiconducting to metallic. The physical mechanism of strain-dependent band structure may be ascribed to the shifts of the energy bands impelled by different superposition of atomic orbitals. Meanwhile, our calculations manifest that band gap values of MnPSe3/CrSiTe3 heterostructures are insensitive to the electric field. Even so, by applying a suitable intensity of negative electric field, the band alignment transition from type-I to type-II can also be realized. The efficient band structure modulations via external factors endow MnPSe3/CrSiTe3 heterostructures with great potential in novel applications, such as strain sensors, photocatalysis, spintronic and photoelectronic devices. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6528/aab5ab

Additional details

Identifiers

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
29
Journal Issue
21
Journal Page Range
[9 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
51057906
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
ALIGNMENT; ELECTRIC FIELDS; ELECTRONIC STRUCTURE; MODULATION; NANOELECTRONICS; PHOTOCATALYSIS; SENSORS; STRAINS; TWO-DIMENSIONAL CALCULATIONS; TWO-DIMENSIONAL SYSTEMS; VAN DER WAALS FORCES
Descriptors DEC
CATALYSIS; CRYSTAL LATTICES; CRYSTAL STRUCTURE