High-performance MoOx/n-Si heterojunction NIR photodetector with aluminum oxide as a tunneling passivation interlayer
Creators
- 1. College of Materials Science and Technology, Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, Nanjing University of Aeronautics and Astronautics, Nanjing 211106 (China)
Description
The most effective and potential approach to improve the performance of heterojunction photodetectors is to obtain favorable interfacial passivation by adding an insertion layer. In this paper, MoOx/Al2O3/n-Si heterojunction photodetectors with excellent photocurrents, responsivity and detectivity were fabricated, in which alumina acts as a tunneling passivation layer. By optimizing the post-annealing treatment temperature of the MoOx and the thickness of the ultra-thin Al2O3, the photodetector achieved a ratio of photocurrent to dark current of 3.1 × 105, a photoresponsivity of 7.11 A W−1 (@980 nm) and a detective of 9.85 × 1012 Jones at −5 V bias. Besides, a self-driven response of 0.17 A W−1 and a high photocurrent/dark current ratio of 2.07 × 104 were obtained. The result demonstrated that optimizing the interface of heterojunctions is a promising way to obtain a heterojunction photodetector with high-performance. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1361-6528/abf37cAdditional details
Identifiers
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 32
- Journal Issue
- 27
- Journal Page Range
- [12 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 53065780
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY; S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM OXIDES; ANNEALING; DARK CURRENT; HETEROJUNCTIONS; LAYERS; OPTIMIZATION; PASSIVATION; PHOTOCURRENTS; PHOTODETECTORS; THICKNESS; TUNNEL EFFECT
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHALCOGENIDES; CURRENTS; DIMENSIONS; ELECTRIC CURRENTS; HEAT TREATMENTS; LEAKAGE CURRENT; OXIDES; OXYGEN COMPOUNDS; SEMICONDUCTOR JUNCTIONS