Published December 22, 2014 | Version v1
Journal article

Increased InAs quantum dot size and density using bismuth as a surfactant

  • 1. Microelectronics Research Center, The University of Texas at Austin, Texas 78758 (United States)
  • 2. Department of Electrical Engineering, Yale University, New Haven, Connecticut 06520 (United States)

Description

We have investigated the growth of self-assembled InAs quantum dots using bismuth as a surfactant to control the dot size and density. We find that the bismuth surfactant increases the quantum dot density, size, and uniformity, enabling the extension of the emission wavelength with increasing InAs deposition without a concomitant reduction in dot density. We show that these effects are due to bismuth acting as a reactive surfactant to kinetically suppress the surface adatom mobility. This mechanism for controlling quantum dot density and size has the potential to extend the operating wavelength and enhance the performance of various optoelectronic devices

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
105
Journal Issue
25
Journal Page Range
p. 253104-253104.5
ISSN
0003-6951
CODEN
APPLAB

INIS

Optional Information

Notes
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