Published July 1976
| Version v1
Journal article
Low-pressure sputtering of high-T/sub c/Nb3Ge
Description
A modified technique for the sputtering of high-T/sub c/ Nb3Ge using low Ar pressure is reported. The experimental arrangement involved only conventional equipment and ordinary vacuum conditions. Nb3Si with the A-15 structure was also prepared in a similar manner
Additional details
Identifiers
- DOI
- 10.1007/bf00659199;
Publishing Information
- Journal Title
- Journal of Low Temperature Physics
- Journal Volume
- 24
- Journal Issue
- 1-2
- Series
- J. Low Temp. Phys.
- Journal Page Range
- 111-115
- ISSN
- 0022-2291
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 8289516
- Subject category
- S36: MATERIALS SCIENCE; S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S36: MATERIALS SCIENCE;
- Descriptors DEI
- ARGON; BINARY ALLOY SYSTEMS; CONTROLLED ATMOSPHERES; ELECTRIC POTENTIAL; FILMS; GERMANIUM ALLOYS; NIOBIUM BASE ALLOYS; NIOBIUM SILICIDES; PRESSURE DEPENDENCE; SPUTTERING; SUPERCONDUCTORS; TRANSITION TEMPERATURE
- Descriptors DEC
- ALLOY SYSTEMS; ALLOYS; ELEMENTS; NIOBIUM ALLOYS; NIOBIUM COMPOUNDS; NONMETALS; PHYSICAL PROPERTIES; RARE GASES; SILICIDES; SILICON COMPOUNDS; THERMODYNAMIC PROPERTIES; TRANSITION ELEMENT ALLOYS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- Updated automatically by Metadata and Full-Text Enrichment Agent