Characterization of the porous anodic alumina nanostructures with a metal interlayer on Si substrates
Description
Porous anodic alumina (PAA) films produced by the anodization technique have made possible the mass production of porous nano-scale structures where the pore height and diameter are controllable. A metal interlayer is observed to have a significant influence on the characteristics of these PAA nanostructures. In this study, we investigate in-depth the effect of the current density on the properties of porous anodic alumina nanostructures with a metal interlayer. A thin film layer of tungsten (W) and titanium (Ti) was sandwiched between a porous anodic alumina film and a silicon (Si) substrate to form PAA/W/Si and PAA/Ti/Si structures. The material and optical characteristics of the porous anodic alumina nanostructures, with and without a metal interlayer, on silicon substrates were studied using the scanning electron microscopy, X-ray diffraction (XRD), and temperature-dependent photoluminescence (PL) measurements. The current densities of the porous anodic alumina nanostructures with the metal interlayer are higher than for the PAA/Si, resulting in an increase of the growth rate of the oxide layer. It can be observed from the X-ray diffraction curves that there is more aluminum oxide inside the structure with the metal interlayer. Furthermore, it has been found that there is a reduction in the photoluminescence intensity of the oxygen vacancy with only one electron due to the formation of oxygen vacancies inside the aluminum oxide during the re-crystallization process. This leads to competition between the two kinds of different oxygen-deficient defect centers (F+ and F centers) in the carrier recombination mechanism from the PL spectra of the porous anodic alumina nanostructures, with and without a metal interlayer, on silicon substrates. -- Highlights: • Study of porous anodic alumina (PAA) films with metal interlayers on silicon. • The highly ordered PAA film with a fairly regular nano-porous structure. • The luminescence properties of PAA films were influenced by the current density. • PAA film with a higher current density has a larger carrier confinement
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jlumin.2013.12.029Additional details
Identifiers
- DOI
- 10.1016/j.jlumin.2013.12.029;
- PII
- S0022-2313(13)00851-X;
Publishing Information
- Journal Title
- Journal of Luminescence
- Journal Volume
- 148
- Journal Page Range
- p. 285-289
- ISSN
- 0022-2313
- CODEN
- JLUMA8
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45067158
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM OXIDES; ANODIZATION; CURRENT DENSITY; NANOSTRUCTURES; PHOTOLUMINESCENCE; POROUS MATERIALS; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; THIN FILMS; TITANIUM; TUNGSTEN; X-RAY DIFFRACTION
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHALCOGENIDES; CHEMICAL COATING; COHERENT SCATTERING; CORROSION PROTECTION; DEPOSITION; DIFFRACTION; ELECTROCHEMICAL COATING; ELECTROLYSIS; ELECTRON MICROSCOPY; ELEMENTS; EMISSION; FILMS; LUMINESCENCE; LYSIS; MATERIALS; METALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; PHOTON EMISSION; REFRACTORY METALS; SCATTERING; SEMIMETALS; SURFACE COATING; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.