Published January 3, 2011
| Version v1
Journal article
Effective work function lowering of multilayer graphene films by subnanometer thick AlOx overlayers
- 1. Division of Industrial Metrology, Korea Research Institute of Standards and Science, 1 Doryong-dong, Yuseong-gu, Daejeon 305-340 (Korea, Republic of)
- 2. Display Laboratory, Samsung Advanced Institute of Technology, P.O. Box 111 Suwon 440-600 (Korea, Republic of)
- 3. Department of Nano Science, University of Science and Technology, 52 Eoeun-dong, Daejeon 305-333 (Korea, Republic of)
- 4. Department of Advanced Materials Engineering for Information and Electronics, Kyung Hee University, 1 Seocheon-dong, Giheung-gu, Yongin-si, Gyeonggi-do 446-701 (Korea, Republic of)
Description
A simple method for controlling the effective work function (WF) of conductive multilayer graphene (MLG) film, synthesized by using chemical vapor deposition and transferred to a dielectric substrate, was developed. The WFs of the MLG during the step-by-step deposition of aluminum (Al) were measured using in situ ultraviolet photoelectron spectroscopy. Core-level spectra were also collected to investigate the chemical reaction that occurred when a small amount of Al was deposited onto MLG in a stepwise manner. The measurements revealed that the effective WF of the conductive MLG film could be controlled from 3.77 to 4.40 eV by the deposition of an Al layer less than 0.6 nm thick.
Additional details
Identifiers
- DOI
- 10.1063/1.3534795;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 98
- Journal Issue
- 1
- Journal Page Range
- p. 013505-013505.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42108885
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ALUMINIUM; ALUMINIUM COMPOUNDS; CARBON; CHEMICAL REACTIONS; CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; HONEYCOMB STRUCTURES; LAYERS; PHOTOELECTRON SPECTROSCOPY; SPECTRA; SUBSTRATES; THIN FILMS; ULTRAVIOLET RADIATION; WORK FUNCTIONS
- Descriptors DEC
- CHEMICAL COATING; DEPOSITION; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; ELEMENTS; FILMS; FUNCTIONS; MATERIALS; MECHANICAL STRUCTURES; METALS; NONMETALS; RADIATIONS; SPECTROSCOPY; SURFACE COATING
Optional Information
- Notes
- (c) 2011 American Institute of Physics