Published 2013 | Version v1
Journal article

Alterations in transcriptome and proteome on metallothioneins following oxidative stress induced by sublethal doses of cadmium and gamma rays in Plantago ovata

  • 1. Department of Biophysics, Molecular Biology and Bioinformatics, University of Calcutta, Kolkata (India)
  • 2. UGC-DAE Consortium for Scientific Research, Kolkata Centre, Radiation Biology Division, Salt Lake, Kolkata (India)

Description

Purpose: To study the oxidative stress-induced changes by sublethal doses of cadmium chloride (CdCl2) and gamma irradiation, two redox-inducing agents, on metallothionein (MT) gene and protein expression in Plantago ovata Forsk (P. ovata). Materials and methods: Chlorophyll content was estimated to study the stress response in P. ovata seedlings following exposure to gamma irradiation and CdCl2. Lipid peroxidation and proline content, two oxidative stress markers, were also studied. The level of metallothionein gene and protein expression was further investigated using polymerase chain reaction (PCR), reverse transcription-PCR (RT-PCR), immunocytochemistry and flow cytometry. Results: Three MT genes of P. ovata namely PoMT 1, PoMT 2 and PoMT 3 were isolated, sequenced and characterized and their expressions were found to be altered in the case of both oxidative stresses in a dose-dependent and tissue-specific manner. The results were in agreement with the observations from immunocytochemistry and FACS analysis. Conclusions: The results suggest that both gamma irradiation and CdCl2 alter redox balance in P. ovata. The metallothionein gene may play an important role in metal tolerance and stress balance. It is conjectured that the stress-mediated imbalance is maintained by altered MT gene and protein expression. (authors)

Availability note (English)

Also available at: https://doi.org/10.3109/09553002.2013.782109

Additional details

Identifiers

Publishing Information

Journal Title
International Journal of Radiation Biology
Journal Volume
89
Journal Issue
7
Journal Page Range
p. 571-582
ISSN
0955-3002