Controlled synthesis of buried delta-layers of Ag nanocrystals for near-field plasmonic effects on free surfaces

We report on the shallow synthesis by low energy ion implantation of delta-layers of Ag nanocrystals in SiO2 at few nanometers under its free surface. Transmission electron microscopy observations, ballistic simulations, and reflectance measurements are coupled to define the conditions for which the synthesis is fully controlled and when, on the contrary, this control is lost. We show that low dose implantation leads to the formation of a well-defined single plane of nanocrystals, while for larger doses, sputtering and diffusion effects limit the control of the size, position, and volume amount of these nanocrystals. This paper provides the experimental evidence of the incorporated dose saturation predicted in the literature when implanting metal ions at high doses in glass matrices. Its consequences on the particle population and the plasmonic optical response of the composite layers are carefully analyzed. We show here that this saturation phenomenon is underestimated in standard simulation predictions due to diffusion of metal atoms towards the surface and nanocrystal nucleation during the implantation process.