Ultrasharp tungsten tips—characterization and nondestructive cleaning

We study the treatment of ultrasharp tungsten tips used for applications in nanoscience and introduce a fast and simple method for estimation of the tip radius using a single measurement of the autoemission current. The method is based on a detailed investigation of the influence of an arrangement of electrodes on the electric field layout in close proximity of the tip apex. The electric field was calculated using Monte Carlo Floating Random Walk algorithm. The most frequently used cleaning procedures (heating the whole tip to high temperature, electron bombardment and self-sputtering) were investigated by electrical measurements and microscopy techniques (SEM, TEM) and the results of the particular methods are compared. We report on the effectiveness and limiting conditions of the cleaning methods with respect to the damage they cause to the tip apex. -- Highlights: ► The article describes methods how to prepare, characterize and clean ultrasharp tungsten tips. ► A novel method for estimating the tip radius based on a single measurement of autoemission current is described. ► MCFRW (Monte Carlo Floating Random Walk) method is used to calculate an electric field in proximity of the tip apex. ► The most frequently used tip cleaning procedures are investigated. ► Effectiveness and optimal cleaning conditions are discussed for each of the methods.