Published January 1, 2013 | Version v1
Journal article

Electrochemical behavior of anodized AA6063-T6 alloys affected by matrix structures

  • 1. Department of Mechanical Engineering, National Central University, Chung-Li 32001, Taiwan (China)

Description

Highlights: ► Deformation after solution treatment introduced Al matrix to have deformation bands and few Si particles. ► Dislocations remained in the matrix lift up field potential and produce AlOOH oxide in the AAO film. ► The silicon-containing particles were found to trap in the AAO film. ► The silicon particles and the Al(OOH) oxide is significantly to influence the electrochemical behavior of AAO films. - Abstract: AA 6063 alloys were cold-rolled (CR) either before or after solution treatment (S) and then different samples were artificially aged (T6) to obtain different samples (CRST6 and SCRT6). The highest dislocation density was observed in the SCRT6 sample which also showed the lowest particle count among the three samples; ST6, CRST6 and SCRT6. Subsequently, all samples were anodized in a 15 wt% sulfuric acid solution for different time spans to obtain anodic aluminum oxide (AAO) films. The anodized samples were further analyzed with X-ray Photoelectron Spectroscopy (XPS) analysis. We determined that the constituent phases in the AAO film were composed of hydrated amorphous alumina, hydrated oxide (Al(OH)3) and oxyhydroxide (AlOOH) phases together with some silicon-containing particles trapped in the films on all samples. In the electrochemical test, the silicon-containing particles and hydrated Al(OH)3 oxide that existed at the electrolyte/film (e/f) interface were found to inversely influence the corrosion resistance of the anodized samples.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2012.10.036

Additional details

Identifiers

DOI
10.1016/j.apsusc.2012.10.036;
PII
S0169-4332(12)01761-8;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
264
Journal Page Range
p. 410-418
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.