Published January 2009
| Version v1
Journal article
Reflection characteristics of Cr alloy films by sputtering method
Creators
- 1. Hitachi Metals, Ltd., Metallurgical Research Laboratory, Yasugi, Shimane (Japan)
- 2. Shimane Univ., Interdisciplinary Faculty of Science and Engineering, Matsue, Shimane (Japan)
Description
no abstract available
Additional details
Publishing Information
- Journal Title
- Hyomen Gijutsu
- Journal Volume
- 60
- Journal Issue
- 1
- Journal Page Range
- p. 63-65
- ISSN
- 0915-1869
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 40093025
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- No Abstract
- Descriptors DEI
- BINARY ALLOY SYSTEMS; CHROMIUM BASE ALLOYS; CRYSTAL STRUCTURE; FILMS; LAVES PHASES; MANGANESE ALLOYS; MOLYBDENUM ALLOYS; NIOBIUM ALLOYS; OPTICAL REFLECTION; REFLECTIVITY; SOLID SOLUTIONS; SPUTTERING; TITANIUM ALLOYS; TUNGSTEN ALLOYS; VANADIUM ALLOYS; X-RAY DIFFRACTION
- Descriptors DEC
- ALLOY SYSTEMS; ALLOYS; CHROMIUM ALLOYS; COHERENT SCATTERING; DIFFRACTION; DISPERSIONS; HOMOGENEOUS MIXTURES; MIXTURES; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; REFLECTION; SCATTERING; SOLUTIONS; SURFACE PROPERTIES; TRANSITION ELEMENT ALLOYS
Optional Information
- Notes
- 8 refs., 3 figs.